DEVICE FOR CONTROLLING AN APPARATUS GENERATING A CHARGED PARTICLE BEAM

摘要

The invention concerns a device for controlling an apparatus generating a charged particle beam. Said device comprises control means (40) for storing the desired characteristics for the beam (14), determining parameter values for controlling the apparatus (2) based on said characteristics, storing said values and supplying said stored values to the parameters controlling the apparatus. The invention is in particular applicable to the manufacture of nanostructures.