| 摘要 |
PROBLEM TO BE SOLVED: To efficiently produce a mask having required mask patterns. SOLUTION: A method for producing a mask is provided which includes a mask making step in which a first required mask pattern is divided into first mask pattern portions 1 and a second mask pattern portion 2, and pattern formation, development and etching are carried out to separately make a first mask having the first mask pattern portions 1 and a second mask having the second mask pattern portion 2, and a first superposing step in which the first mask and the second mask are superposed and combined in such a way that the top surfaces and bottom surfaces of the first mask pattern portions 1 and the second mask pattern portion 2 are aligned on the same planes, respectively, to obtain the above first required mask pattern. |
