| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat-developable photosensitive material which has improved resistance to scuffing, particularly scuffing immediately after heat development, film sticking and bleed-out. SOLUTION: The heat-developable photosensitive material uses, as a binder, a polyvinyl butyral resin containing 2 to 20 parts by mass of an ethylene oxide adduct of the formula RO-(CH2 CH2 O)n -H (where R is a 1-24C alkyl or a 0-18C alkyl substituted aryl and n is 1 to 10).
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