发明名称 Method and materials for purifying hydride gases, inert gases, and non-reactive gases
摘要 A process for removing trace amounts of moisture and/or one or more impurities from contaminated hydride, inert and non-reactive gases, thus decreasing the concentration of the impurities to parts-per-billion (ppb) or parts-per-trillion (ppt) levels. The gas purifier materials of this invention include thermally activated aluminas, said aluminas including organic alumina materials, modified organic alumina materials, and modified inorganic aluminas. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 50° C.-1000° C. in an inert or non-inert atmosphere or in a vacuum and maintaining the activated material in the inert or non-inert atmosphere or in a vacuum atmosphere subsequent to said activation but prior to use.
申请公布号 US2003097932(A1) 申请公布日期 2003.05.29
申请号 US20020260060 申请日期 2002.09.27
申请人 WATANABE TADAHARU;FRAENKEL DAN 发明人 WATANABE TADAHARU;FRAENKEL DAN
分类号 B01D53/46;B01J20/08;B01J20/22;B01J20/30;(IPC1-7):B01D53/02 主分类号 B01D53/46
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