发明名称 Forming defect prevention trenches in dicing streets
摘要 A method of dicing a microelectronic device wafer comprising forming at least one trench in at least one dicing street on the microelectronic device wafer, wherein the trench prevents cracking and/or delamination problems in the interconnect layer of the microelectronic device wafers caused by a subsequent dicing by a wafer saw.
申请公布号 US2003100143(A1) 申请公布日期 2003.05.29
申请号 US20010997086 申请日期 2001.11.28
申请人 MULLIGAN ROSE A.;HE JUN;MARIEB THOMAS;MENEZES SUSANNE;TOWLE STEVEN 发明人 MULLIGAN ROSE A.;HE JUN;MARIEB THOMAS;MENEZES SUSANNE;TOWLE STEVEN
分类号 B23K26/40;H01L21/00;H01L21/301;H01L21/304;H01L21/44;H01L21/78;H01L23/00;(IPC1-7):H01L21/44 主分类号 B23K26/40
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