发明名称 |
METHOD FOR PRODUCING AN ANTIFUSE AND ANTIFUSE FOR ALLOWING SELECTIVE ELECTRICAL CONNECTION OF NEIGHBOURING CONDUCTIVE ZONES |
摘要 |
<p>A method for producing antifuse structures and antifuses by which adjacent conductive regions can be selectively electrically connected involve the application of a sacrificial layer to a first conductive region. The sacrificial layer is patterned with the aid of a photolithographic method. A fuse layer is applied and the sacrificial layer is then removed. A non-conductive layer is applied and a conductive material is introduced in an opening in the non-conductive layer for the purpose of forming a second conductive region.</p> |
申请公布号 |
EP1314201(A1) |
申请公布日期 |
2003.05.28 |
申请号 |
EP20010958074 |
申请日期 |
2001.08.16 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
LEHR, MATTHIAS;SCHILLING, UWE;POLEI, VERONIKA;SPERL, IRENE |
分类号 |
H01L23/52;H01L21/3205;H01L21/82;H01L23/525;(IPC1-7):H01L23/525 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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