发明名称 METHOD FOR PRODUCING AN ANTIFUSE AND ANTIFUSE FOR ALLOWING SELECTIVE ELECTRICAL CONNECTION OF NEIGHBOURING CONDUCTIVE ZONES
摘要 <p>A method for producing antifuse structures and antifuses by which adjacent conductive regions can be selectively electrically connected involve the application of a sacrificial layer to a first conductive region. The sacrificial layer is patterned with the aid of a photolithographic method. A fuse layer is applied and the sacrificial layer is then removed. A non-conductive layer is applied and a conductive material is introduced in an opening in the non-conductive layer for the purpose of forming a second conductive region.</p>
申请公布号 EP1314201(A1) 申请公布日期 2003.05.28
申请号 EP20010958074 申请日期 2001.08.16
申请人 INFINEON TECHNOLOGIES AG 发明人 LEHR, MATTHIAS;SCHILLING, UWE;POLEI, VERONIKA;SPERL, IRENE
分类号 H01L23/52;H01L21/3205;H01L21/82;H01L23/525;(IPC1-7):H01L23/525 主分类号 H01L23/52
代理机构 代理人
主权项
地址