发明名称 |
FIELD EFFECT TRANSISTOR |
摘要 |
PURPOSE: A field effect transistor(FET) is provided to control the density of electrons formed in a channel by forming a stress deriving layer on a channel layer of the FET such that the stress deriving layer has a lattice constant different from that of the channel layer. CONSTITUTION: The channel layer(15) is formed on a substrate(20). A barrier layer(14) is formed on the channel layer. The stress deriving layer(13) controls the stress of the barrier layer, formed on the barrier layer and having a lattice constant different from that of the barrier layer. A passivation layer is formed on the stress deriving layer. The channel layer is a GaN layer. The barrier layer is an AlxGa1-xN layer.
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申请公布号 |
KR20030042324(A) |
申请公布日期 |
2003.05.28 |
申请号 |
KR20010073058 |
申请日期 |
2001.11.22 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
KIM, JONG UK;LEE, JAE SEUNG |
分类号 |
H01L29/772;(IPC1-7):H01L29/772 |
主分类号 |
H01L29/772 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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