发明名称 FIELD EFFECT TRANSISTOR
摘要 PURPOSE: A field effect transistor(FET) is provided to control the density of electrons formed in a channel by forming a stress deriving layer on a channel layer of the FET such that the stress deriving layer has a lattice constant different from that of the channel layer. CONSTITUTION: The channel layer(15) is formed on a substrate(20). A barrier layer(14) is formed on the channel layer. The stress deriving layer(13) controls the stress of the barrier layer, formed on the barrier layer and having a lattice constant different from that of the barrier layer. A passivation layer is formed on the stress deriving layer. The channel layer is a GaN layer. The barrier layer is an AlxGa1-xN layer.
申请公布号 KR20030042324(A) 申请公布日期 2003.05.28
申请号 KR20010073058 申请日期 2001.11.22
申请人 LG ELECTRONICS INC. 发明人 KIM, JONG UK;LEE, JAE SEUNG
分类号 H01L29/772;(IPC1-7):H01L29/772 主分类号 H01L29/772
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