| 摘要 |
PURPOSE: Provided is a positive photoresist composition which can reduce the excess usage of expensive dissolution inhibitor, and has excellent resolution and high degree of photosensitivity. CONSTITUTION: The positive photoresist composition comprising an alkali-soluble phenol novolac resin, a photoactive compound(PAC) which is a dissolution inhibitor based on O-naphthaquinone diazide sulfonic ester, a solvent, a dye, and an additive, is characterized by further comprising p-t-butylphenol novolac resin having a repeating unit of formula 1 and a number average molecular weight of 1,000-3,000, as a dissolution inhibiting aid. |
