发明名称 |
Abnormal photoresist line/space profile detection through signal processing of metrology waveform |
摘要 |
A semiconductor manufacturing automation method for analyzing a patterned feature formed on a semiconductor layer is disclosed. At least one patterned feature is scanned to generate an amplitude modulated waveform signal of the line and neighboring space characteristics. Signal processing is automatically performed on this waveform by an in-line computational source to extract known patterned features based on the profile of the amplitude modulated waveform signal. The extracted waveform segments are subjected to known geometric shapes to determine if the waveform indicates a normal or abnormal patterned feature on a semiconductor layer. |
申请公布号 |
GB0308961(D0) |
申请公布日期 |
2003.05.28 |
申请号 |
GB20030008961 |
申请日期 |
2003.04.17 |
申请人 |
OF SINGAPORE;AGERE SYSTEMS INC |
发明人 |
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分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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