| 摘要 |
A radiation assisted electron emission device uses semiconductor or semi-insulator material formed with an emission mechanism such as a field emission tip, a thermionic emission device, or a negative electron affinity emitter as a source of electrons. The material is irradiated with a source of radiation, such as electromagnetic radiation, neutron radiation, or charged particle radiation, which excites electron-hole pairs in the material to generate a population of free conducting electrons. The electrons are driven to the emission mechanism by a suitable transport process, such as diffusion or drift. The electron emission device has applicability to a broad range of technologies where an electron beam or current is used.
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