发明名称 |
STRUCTURE FOR ATTACHING PELLICLE TO PHOTO-MASK |
摘要 |
PURPOSE: A structure for attaching a pellicle to a photo-mask is provided to be capable of preventing the deformation phenomenon from being generated between the pellicle and the photo-mask due to an adhesive. CONSTITUTION: A protruding part(1a) is formed at the predetermined peripheral portion of a pellicle frame(1) as one piece for loading a photo-mask(5). At this time, the pellicle frame is pressed toward the photo-mask direction by using an 'L' shaped sub-part(8) connected with the protruding part. The contact state between the pellicle frame and the photo-mask, is stably conserved without the shape deformation generated between the pellicle frame and the photo-mask by indirectly connecting the pellicle frame with the photo-mask using the sub-part and an adhesive.
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申请公布号 |
KR20030041811(A) |
申请公布日期 |
2003.05.27 |
申请号 |
KR20020071975 |
申请日期 |
2002.11.19 |
申请人 |
ASAHI GLASS COMPANY LTD. |
发明人 |
MISHIRO HITOSHI;KIKUGAWA SHINYA;OKADA KANAME;KAWAHARA TAKAYUKI;TERAKAD0 MORIO |
分类号 |
H01L21/027;G03F1/14;G03F1/64;G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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