发明名称 |
IMPLANT DESIGN METHOD AND IMPLANT |
摘要 |
PROBLEM TO BE SOLVED: To provide an implant design method and an implant excellent in shape adaptability to a defective bone. SOLUTION: The implant design method for designing an implant applied to a defective bone includes a process for fabricating the three-dimensional data of the bone based on data on a plurality of tomograms of the bone, and a process for predicting the shape of the bone which must be present at a defect. The predicted shape is corrected on at least a portion of the implant along its circumferential direction so as to conform to the shape of the cut plane of the bone. This correction is preferably made by first predicting the shape of the implant conforming to the shape of the contour of the cut plane on the outer surface of the bone and having a predetermined thickness, then deleting data on a portion overlying the bone from the predicted shape data. |
申请公布号 |
JP2003153925(A) |
申请公布日期 |
2003.05.27 |
申请号 |
JP20010357535 |
申请日期 |
2001.11.22 |
申请人 |
PENTAX CORP |
发明人 |
ABE KEITA;SHIOTANI SHINGO;KATO MOTOKATSU;YOSHIDA TAKAMITSU |
分类号 |
A61B19/00;A61B17/56;A61F2/00;A61F2/28;A61F2/30;B29C67/00;G05B19/4097 |
主分类号 |
A61B19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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