VACUUM FORMING EQUIPMENT FOR SEMICONDUCTOR FABRICATION EQUIPMENT

摘要

PURPOSE: A vacuum forming equipment for semiconductor fabrication equipment is provided to prevent a damage of an impeller of a turbo pump by forming a structure for venting the inside of the turbo pump. CONSTITUTION: A turbo pump(3') and a dry pump(5') are installed on a vacuum line(7'). The first and the second throttle valves(9a',9b') are installed on the vacuum line in order to control the internal pressure of a process chamber(1'). The first to the third isolation valves(11a',11b',11c') are used for opening or shutting the vacuum line in order to isolate the process chamber from the turbo pump and the dry pump. An exhaust line(13') and an exhaust valve(15') are installed at one side of the process chamber. A purge line(17') is connected with the turbo pump. A purge valve is installed at the purge line in order to supply nitrogen to the turbo pump. A turbo pump vent portion(20') is formed with a vent line(21') and a vent valve(23').