发明名称 DEVICE AND METHOD FOR TREATING SUBSTRATE, IMAGE DISPLAY DEVICE AND ITS MANUFACTURING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method and a device for treating a substrate, capable of manufacturing an image display device having an improved withstand voltage, by removing a corpuscle on the substrate composing the image display device. SOLUTION: A conductor 42 is disposed so as to face the substrate 11 to be treated which is installed in a substrate installation part 34. A voltage is applied between the substrate to be treated and the conductor by a voltage supply part 44 to generate an electric field, and thereby the corpuscle 9 on the substrate to be treated is attracted to the conductor. A dielectric 50 is provided between the conductor and the substrate to be treated, and the corpuscle attracted to the conductor is captured by the dielectric.</p>
申请公布号 JP2003151435(A) 申请公布日期 2003.05.23
申请号 JP20010346451 申请日期 2001.11.12
申请人 TOSHIBA CORP 发明人 IZEKI YASUSHI;KUWABARA YUJI;MURATA HIROTAKA
分类号 H01J9/24;H01J9/02;H01J9/26;H01J9/38;H01J9/40;H01J31/12;(IPC1-7):H01J9/24 主分类号 H01J9/24
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