发明名称 |
DEVICE AND METHOD FOR TREATING SUBSTRATE, IMAGE DISPLAY DEVICE AND ITS MANUFACTURING DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for treating a substrate, capable of manufacturing an image display device having an improved withstand voltage, by removing a corpuscle on the substrate composing the image display device. SOLUTION: A conductor 42 is disposed so as to face the substrate 11 to be treated which is installed in a substrate installation part 34. A voltage is applied between the substrate to be treated and the conductor by a voltage supply part 44 to generate an electric field, and thereby the corpuscle 9 on the substrate to be treated is attracted to the conductor. A dielectric 50 is provided between the conductor and the substrate to be treated, and the corpuscle attracted to the conductor is captured by the dielectric.</p> |
申请公布号 |
JP2003151435(A) |
申请公布日期 |
2003.05.23 |
申请号 |
JP20010346451 |
申请日期 |
2001.11.12 |
申请人 |
TOSHIBA CORP |
发明人 |
IZEKI YASUSHI;KUWABARA YUJI;MURATA HIROTAKA |
分类号 |
H01J9/24;H01J9/02;H01J9/26;H01J9/38;H01J9/40;H01J31/12;(IPC1-7):H01J9/24 |
主分类号 |
H01J9/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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