FOCUSING METHOD, POSITION-MEASURING METHOD, EXPOSURE METHOD, AND DEVICE-MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To achieve an accurate focus adjustment with high throughput regardless of reflection characteristics of a mask. SOLUTION: A first object is observed and at the same time the focusing position of a second optical system for observing a second object via the first object and a first optical system is matched to the specific surface of the first object. There are a step S8 for matching the specific surface of the second object to a position that is optically conjugate to the specific surface on the first object to the first optical system and a step S10 for matching the focusing position of the second optical system to the specific surface on the second object via the first optical system.