发明名称 SYSTEM FOR DESIGNING SHADOW MASK
摘要 PROBLEM TO BE SOLVED: To provide a system for designing a shadow mask to design an exposure mask having a hole shape (a large diameter and a small diameter) of the most suitable open mask at each position of the shadow mask and to set manufacturing conditions, for the design values of the shadow mask. SOLUTION: This system for designing a shadow mask is provided with a means 10 to numerically express the hole shape of the open mask of the shadow mask by a measuring instrument having a three-dimensional shape, a means 20 to convert the numerically expressed data to a data base, a means 30 to input the design values of the shadow mask and to display inputted results, a means 40 to retrieve the data in the data base and to list up the candidates of the data for the hole shapes (a large hole diameter and a small hole diameter) close to the design values, a means 50 to combine the candidates of the data for the hole shapes on a three-dimensional CAD and to squeeze out the hole shape of the open mask which is close to design specification values by simulating them, and a means 60 to calculate a mask weight and to list up open mask data for the exposure mask (a large hole diameter and a small hole diameter) and the manufacturing conditions.
申请公布号 JP2003151431(A) 申请公布日期 2003.05.23
申请号 JP20010352983 申请日期 2001.11.19
申请人 TOPPAN PRINTING CO LTD 发明人 KIYONO SHIGEYA;FUKAGAWA HIROTAKA
分类号 H01J9/42;H01J9/14;(IPC1-7):H01J9/14 主分类号 H01J9/42
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