发明名称 METHOD FOR TREATING RESIST
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for recycling resist to be disposed. SOLUTION: A resist-treating apparatus comprises a viscosity adjustment tank where the waste liquid of resist is supplied, a solvent tank for supplying a solvent to the viscosity adjustment tank, a viscometer for measuring viscosity in a resist liquid in the viscosity adjustment tank, a control section that calculates the resin concentration of the resist liquid, based on the measurement result of the viscometer and the temperature of the resist liquid in the viscosity adjustment tank and determines the amount of solvent which is to be supplied to the resist liquid, based on the difference between the calculated resin concentration and the preset concentration, and a filter for removing impurities in the resist, where the viscosity has been adjusted.
申请公布号 JP2003151901(A) 申请公布日期 2003.05.23
申请号 JP20020299939 申请日期 2002.10.15
申请人 OKI ELECTRIC IND CO LTD;MIYAZAKI OKI ELECTRIC CO LTD 发明人 OTA YASUHARU;ITO YOSHIZUMI
分类号 G03F7/26;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/26
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