发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device and the manufacturing method of the same capable of improving a level of integration, by forming a wiring pattern on the whole of upper surface of a multilayer board without necessitating any expensive manufacturing facility. SOLUTION: The semiconductor device unit 54, in which a semiconductor element 70 is mounted on a two-layer board, is piled on the semiconductor unit 53, in which the semiconductor element 70 is mounted on the two-layer board, through lamination bumps 80, 80,... and ACFs 64 arranged around the bumps. Then the units 53, 54 are connected electrically.</p>
申请公布号 JP2003152161(A) 申请公布日期 2003.05.23
申请号 JP20020237124 申请日期 2002.08.15
申请人 DT CIRCUIT TECHNOLOGY CO LTD 发明人 HIRAI HIROYUKI;FUKUOKA YOSHITAKA
分类号 H01L25/18;H01L25/10;H01L25/11;(IPC1-7):H01L25/10 主分类号 H01L25/18
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