发明名称 LIQUID TREATMENT METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To enable an increase treatment efficiency and throughput and also to enable the prevention of treatment liquid deterioration and the prolongation of its life, by controlling the temperature of treatment liquid within an allowable temperature range. SOLUTION: In a liquid treatment method wherein an agent L contained in a tank 10 can be temperature-adjusted, i.e., heated or cooled and circulated in a standby state, the agent L in the standby circulation is supplied to wafers W accommodated in a treatment chamber 6 for their treatment; the agent L in the tank 10 is heated and cooled at the same time during its standby circulation, to thereby control the temperature of the agent L within an allowable temperature range for the preparation of the next treatment.
申请公布号 JP2003151898(A) 申请公布日期 2003.05.23
申请号 JP20020241505 申请日期 2002.08.22
申请人 TOKYO ELECTRON LTD 发明人 FUJISHIMA SADAYUKI
分类号 B08B3/10;H01L21/027;H01L21/304;(IPC1-7):H01L21/027 主分类号 B08B3/10
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