| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method of treating a surface, which enables cleaning and drying of a plate to be treated by only an apparatus of simple structure. SOLUTION: In the surface treatment apparatus 1B, a plate 100 to be treated is supported on an apparatus body 11. With a leading end part 21 of a scanning head 2 being close to a treatment face 101 of the plate 100 to be treated, a cleaning liquid R is supplied into a space 20 between the treatment face 101 and the leading end 21 from a liquid outlet port 42 formed in the scanning head 2. While the cleaning liquid R is supplied, the scanning head 2 is stepped over along the plate 100, to be treated to clean the plate 100. Then, with a surface active gas being supplied near the meniscus M of the cleaning liquid, R formed at the backward side in the scanning direction of the scanning head 2 from a gas outlet port 192 formed in the scanning head 2, the scanning head 2 is stepped over along the plate 100 to be treated to make the meniscus M move along the treatment face 101 to dry the treatment face 101.
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