发明名称 APPARATUS AND METHOD OF TREATING SURFACE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and a method of treating a surface, which enables treatment by a treatment liquid, cleaning, and drying of a plate to be treated, by only a single apparatus of a simple structure. SOLUTION: In a surface treatment apparatus 1A, with an opposite face 31 of a vehicle 3 which is close to a treatment face 101 of a plate 100 to be treated, a treatment liquid T is supplied from treatment liquid outlet ports 62a-62h into a space 10 in between the treatment face 101 and the opposite face 31 of the vehicle 3 to treat the treatment face 101. Then, a cleaning liquid R is supplied from a cleaning liquid outlet port 72 for cleaning the treatment face 101. Then, with the plate 100 kept in a non-horizontal state, a surface active gas is supplied near a meniscus M of the cleaning liquid R formed at the higher side of the plate 100, to be treated from a gas outlet port (the treatment liquid outlet port 62a), formed in the vehicle 3. While the surface active gas is supplied, the vehicle 3 is pivoted about a part near the edge 102 at the lower side of the plate 100 to be treated as the pivoting center 30 for moving the meniscus M along the treatment face 101 toward the pivoting center 30 side to dry the treatment face 101.
申请公布号 JP2003151947(A) 申请公布日期 2003.05.23
申请号 JP20010343476 申请日期 2001.11.08
申请人 SEIKO EPSON CORP 发明人 KASUGA HIROBUMI
分类号 B08B3/08;C23G1/00;C23G1/02;C23G3/00;H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/08
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