IMPURITY DIFFUSION METHOD TO SEMICONDUCTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To uniformly diffuse impurities to a semiconductor substrate from a solid impurity source in a diffusion batch. SOLUTION: When a disk-like solid impurity 1 and a pair of semiconductor substrates 2a and 2b whose rears are arranged, so that the back to back are alternately placed on a wafer board 4 for heating in a furnace, the interval between an interval L1 between a semiconductor substrate that is arranged at the side of a furnace opening 5 in the pair of semiconductor substrates and a solid impurity source and an interval L2 between the semiconductor substrate, that is arranged at the side of a gas introduction opening 6 and the solid impurity source is provided, so that the relation L1>L2 is achieved.