发明名称 |
Manufacturing method and structure of slanting diffusive reflector |
摘要 |
The invention discloses a manufacturing method and structure of slanting diffusive reflectors that simplifies their manufacturing process and reduces cost. The invention uses a photo mask comprising a plurality of half-tone exposure units. A half-tone photolithography process is performed on the positive photoresist formed on a substrate. Only one exposure process and a suitable drying step are required to form a plurality of slants and rough astigmatisms on the slants. The size of the half-tone exposure units is randomly selected. Each half-tone exposure unit comprises a plurality of parallel transmitting strips or shadow strips. The pitch of the transmitting strips or the shadow strips in one half-tone exposure unit can be arbitrary. The width of the shadow strips is gradually changing from one side of the half-tone exposure unit to the other side.
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申请公布号 |
US2003096198(A1) |
申请公布日期 |
2003.05.22 |
申请号 |
US20010988057 |
申请日期 |
2001.11.16 |
申请人 |
WONG YI-CHUN;WEI MING-DAR;CHANG SHANG-WEN |
发明人 |
WONG YI-CHUN;WEI MING-DAR;CHANG SHANG-WEN |
分类号 |
G02F1/1335;G03F7/00;G03F7/20;(IPC1-7):G03C5/00;G03F9/00 |
主分类号 |
G02F1/1335 |
代理机构 |
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主权项 |
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地址 |
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