DRY ETCHER

摘要

PURPOSE: A dry etcher is provided to make a wafer from being contaminated by particles and prevent a process defect by eliminating the particles caused by etch gas remaining on the wafer after a process is completed. CONSTITUTION: A cassette(112) including a wafer is placed on a cassette table(110). The wafer included in the cassette is processed in a process chamber(150). A loadlock chamber temporarily stores the wafer to be processed in the process chamber and the wafer having been processed in the process chamber. A transfer chamber transfers the wafer. A removing unit(200) removes the process gas remaining on the completed wafer.