发明名称 PROCESS OF ADHERING TITANIUM METAL LAYER TO SUBSTRATE SURFACE
摘要 <p>The present invention described a method of adhering titanium metal layer to substrate surface, comprising : (a) providing heating apparatus and diffusion layer in chamber ; (b) utilizing platform with through holes which connected to air purge unit ; (c) placing adhesive layer (solid under room temperature) and titanium metal layer ; (d) heating chamber to predetermined temperature by heating apparatus and diffusion layer ; permitting heating energy generated by heating apparatus permeating through diffusion layer so as to homogeneously conducting to titanium metal layer ; adhesive layer and substrate, melting adhesive layer and rarefying air in chamber ; (e) sucking through holes by air purge unit, permitting titanium and adhesive layer adhering together to substrate surface smoothly and strongly due to suction.</p>
申请公布号 WO2003041958(P1) 申请公布日期 2003.05.22
申请号 CN2002000787 申请日期 2002.11.05
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