| 摘要 |
PURPOSE: A monomer, a polymer prepared by using the monomer and a photoresist resin composition containing the polymer for the chemical amplification type negative photoresist are provided, to improve the sensitivity and to prevent the swelling during development. CONSTITUTION: The monomer is represented by the formula 1, wherein R1 and R2 are H, CH3, OH, CH2OH, COOCH3 or COOC(CH3)3, respectively; R3 is blank or is a saturated alkyl group of C1-C5, an ether group of C1-C5, a carbonyl group of C1-C5 or an alcohol group of C1-C5; and R4 is a saturated alkyl group of C1-C5, an ether group of C1-C5, a carbonyl group of C1-C5 or an alcohol group of C1-C5. Preferably the polymer is represented by the formula 2, 3 or 4, wherein a and b are 0.01-0.49, respectively, c is 0.5 and a+b is 0.5; d, e and f are 0.01-0.48, respectively, g is 0.5, and d+e+f is 0.5; and n is a degree of polymerization. The photoresist resin composition comprises 10-20 wt% of the polymer; and 0.1-5.0 wt% of a photoacid generator. |
