| 摘要 |
A manufacturing method for a photomask includes a step of performing a writing operation at a predetermined scanning unit in a direction in which a head of a writing system is to be scanned (Y direction) and at a predetermined overrun unit in a direction perpendicular to the scanning direction (X direction). A pattern of the photomask includes a cyclic pattern. The writing step includes a step of writing pattern units (e.g., pixel units 20) under identical overrun conditions (e.g., a grid head 17a is aligned with the left end of each pixel unit 20 such that writing is commenced from the left end of each pixel unit 20), the pattern units including identical cyclic patterns.
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