| 摘要 |
<p>The invention concerns a method for adjusting the operating gap of two mechanical elements of a substantially planar mechanical structure obtained by micro-etching. The method consists in attributing (A) to one of the elements (E) a fixed reference position (RF) in the direction of the residual gap separating said elements; connecting (C) the other element (OE) to the fixed reference position (RF) by an elastic link (S) and installing (D) between the fixed reference position (RF) and the other element (OE) at least a stop block defining an abutting gap, maximum displacement amplitude of the other element; subjecting (DE) the other element (OE) to a displacement antagonistic to the elastic link (S) up to the abutting position constituting the operating position, the residual gap being reduced to the difference between residual gap and abutting gap and less than the resolution of the micro-etching process. The invention is applicable to electromechanical resonators.</p> |
