| 摘要 |
<p>A liquid crystal layer (3) exhibiting a cholesteric order is formed on an alignment film (2) formed on a substrate (1). The liquid crystal layer (3) is irradiated with active radiation (4) of predetermined irradiation intensity transmitted through a photomask (10), and the liquid crystal layer (3) is brought into contact with a solvent (5), thereby forming a semi-cured cholesteric layer (3’) having a predetermined pattern. The semi-cured cholesteric layer (3’) is irradiated with active radiation (6) to cure the semi-cured cholesteric layer (3’) with a curing rate gradation from the base (9) side toward the surface opposite to the base (9). As a result, the selected reflection wavelength band of the semi-cured cholesteric layer (3’) is widened. Lastly, by irradiating the semi-cured cholesteric layer (3’) is irradiated with active radiation (8) thereby to form a cured cholesteric layer (3”).</p> |
