| 摘要 |
PURPOSE: A method for fabricating a superconducting Josephson junction device is provided to improve capability, repeatability and reliability by forming a uniform and very thin Josephson interface through an ion implantation method. CONSTITUTION: A superconducting thin film(11) and an amorphous layer are sequentially formed on a substrate(10). A metal material is formed on the edge of the amorphous layer. A heat treatment process is performed on the amorphous layer including the metal material so that the amorphous layer is crystallized by the metal material. A part of the crystallization layer is etched. Ions are implanted into the etched crystallization layer to form an interface(15) of the superconducting thin film.
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