发明名称 |
Wafer defect inspection machine |
摘要 |
A low-cost defect inspection machine for semiconductor wafers that can detect various defects has been disclosed and comprises an optical system that projects a pattern image, an image sensor and a processing circuit that processes the image signal and detects defect portions, wherein the optical system comprises an objective lens, a bright field illumination system that has a semi-transparent mirror and irradiates a specimen through the objective lens with the illumination light reflected by the semi-transparent mirror in the range that includes the optical axis of the objective lens, and a dark field illumination system that has a reflecting mirror provided in the portion except for the projection path of the objective lens and irradiates a specimen through the objective lens with the illumination light reflected by the reflecting mirror.
|
申请公布号 |
US2003094586(A1) |
申请公布日期 |
2003.05.22 |
申请号 |
US20020295621 |
申请日期 |
2002.11.15 |
申请人 |
KUROSAWA TOSHIROU;KATSUKI YUZO;TAKEBAYASHI JUN |
发明人 |
KUROSAWA TOSHIROU;KATSUKI YUZO;TAKEBAYASHI JUN |
分类号 |
G01N21/956;G01N21/95;G02B21/06;G02B21/10;G02B21/12;H01L21/66;(IPC1-7):G01N21/86 |
主分类号 |
G01N21/956 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|