发明名称 Wafer defect inspection machine
摘要 A low-cost defect inspection machine for semiconductor wafers that can detect various defects has been disclosed and comprises an optical system that projects a pattern image, an image sensor and a processing circuit that processes the image signal and detects defect portions, wherein the optical system comprises an objective lens, a bright field illumination system that has a semi-transparent mirror and irradiates a specimen through the objective lens with the illumination light reflected by the semi-transparent mirror in the range that includes the optical axis of the objective lens, and a dark field illumination system that has a reflecting mirror provided in the portion except for the projection path of the objective lens and irradiates a specimen through the objective lens with the illumination light reflected by the reflecting mirror.
申请公布号 US2003094586(A1) 申请公布日期 2003.05.22
申请号 US20020295621 申请日期 2002.11.15
申请人 KUROSAWA TOSHIROU;KATSUKI YUZO;TAKEBAYASHI JUN 发明人 KUROSAWA TOSHIROU;KATSUKI YUZO;TAKEBAYASHI JUN
分类号 G01N21/956;G01N21/95;G02B21/06;G02B21/10;G02B21/12;H01L21/66;(IPC1-7):G01N21/86 主分类号 G01N21/956
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