发明名称 |
Plasma processing apparatus with real-time particle filter |
摘要 |
A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.
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申请公布号 |
US2003094366(A1) |
申请公布日期 |
2003.05.22 |
申请号 |
US20020319695 |
申请日期 |
2002.12.16 |
申请人 |
INABA HIROSHI;SASAKI SHINJI;HIRANO SHINYA;FURUSAWA KENJI;YAMASAKA MINORU;AMATATSU ATSUSHI;XU SHI |
发明人 |
INABA HIROSHI;SASAKI SHINJI;HIRANO SHINYA;FURUSAWA KENJI;YAMASAKA MINORU;AMATATSU ATSUSHI;XU SHI |
分类号 |
H05H1/24;B01J19/08;C23C14/32;C23F4/00;H01J37/32;H01L21/203;H01L21/302;(IPC1-7):C23C16/00;C23C14/00;C25B13/00 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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