| 发明名称 |
Dispersion management optical lithography crystals for below 160nm optical lithography method thereof |
| 摘要 |
The present invention provides fluoride lens material crystals for VUV optical lithography systems and processes. The invention provides a fluoride optical lithography crystal for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons.
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| 申请公布号 |
US2003094128(A1) |
申请公布日期 |
2003.05.22 |
| 申请号 |
US20010991399 |
申请日期 |
2001.11.20 |
| 申请人 |
SPARROW ROBERT W. |
发明人 |
SPARROW ROBERT W. |
| 分类号 |
G02B1/02;C30B11/00;C30B29/12;H01L21/027;(IPC1-7):C30B13/00;C30B21/04;C30B28/08 |
主分类号 |
G02B1/02 |
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