MAGNET ARRAY IN CONJUNCTION WITH ROTATING MAGNETRON FOR PLASMA SPUTTERING

摘要

An array 60 of auxiliary magnets positioned along sidewalls 14 of a magnetron sputter reactor on a side towards the wafer from the target 16. The magnetron preferably is a small, strong one having a stronger outer pole 42 of a first magnetic polarity surrounding a weaker pole 40 of a second magnetic polarity and rotates about the central axis 38 of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets 62 or electromagnets 90.