发明名称 Optical magnification adjustment system and projection exposure device
摘要 An optical magnification adjustment system being capable of minutely correcting magnification. A first lens 1 of plano-convex is installed on the side of an object surface 5, and a second lens 2 of concave-plano is installed on the side of a formed image surface 7. By controlling the center space d between the first lens and the second lens, the image is enlarged or reduced. The radii of curvature R2 and R3 of the convex surface of the first lens and the concave surface of the second lens are respectively set according to the following equations. R2=(1-n1)/phi2 R3=(n2-1)/phi3 where, phi2 and phi3 represent optical power, and n1 and n2 represent refraction indexes, respectively.
申请公布号 US2003095342(A1) 申请公布日期 2003.05.22
申请号 US20020289786 申请日期 2002.11.07
申请人 MATSUMOTO NORIYOSHI;KOWATARI NOZOMU;HIRABAYASHI YOUICHI 发明人 MATSUMOTO NORIYOSHI;KOWATARI NOZOMU;HIRABAYASHI YOUICHI
分类号 G03F7/20;H05K3/00;(IPC1-7):G03B27/42;G02B9/00;G02B9/04 主分类号 G03F7/20
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