| 发明名称 |
Wash water or immersion water used during semiconductor manufacturing |
| 摘要 |
A hydrogen dissolving device 2 is connected to a high-purity water processing device 1. Hydrogen is dissolved into the high-purity water in the hydrogen dissolving device 2 to produce hydrogen-dissolved water. The hydrogen-dissolved water is conveyed via a transport line 7 to a wash apparatus 5 or to an immersion apparatus 6. The hydrogen-dissolved water exiting from the transport line 7 inhibits oxidation of semiconductor devices during wash or immersion process.
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| 申请公布号 |
US2003094610(A1) |
申请公布日期 |
2003.05.22 |
| 申请号 |
US20020280951 |
申请日期 |
2002.10.25 |
| 申请人 |
AOKI HIDEMITSU;TOMIMORI HIROAKI;YAMAMOTO KENICHI;HIRANO KEIJI;TAIRA TSUTOMU;YAMASHITA YUKINARI;FUTATSUKI TAKASHI |
发明人 |
AOKI HIDEMITSU;TOMIMORI HIROAKI;YAMAMOTO KENICHI;HIRANO KEIJI;TAIRA TSUTOMU;YAMASHITA YUKINARI;FUTATSUKI TAKASHI |
| 分类号 |
C02F1/68;C01B3/00;C02F1/32;C02F1/44;C02F1/66;C02F1/70;C02F9/00;C11D11/00;H01L21/00;H01L21/02;H01L21/304;H01L21/306;H01L21/321;H01L21/768;(IPC1-7):H01L23/58 |
主分类号 |
C02F1/68 |
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