MICROSCOPE FOR DETECTING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a microscope which can surely detect the patterns of a work, such as a printed substrate which is coated with a resist and is further formed with a protective layer. SOLUTION: A wavelength selection filter 15 which cuts light below 580 nm in wavelength is disposed within an optical path of alignment light (for example within an illumination light source 11 for alignment). The light released by the illumination light source 11 for alignment is guided to an alignment light exit section 13 for darkfield illumination across an optical fiber 14 and irradiates a work mark WAM from outside the optical path of the imaging system of the alignment microscope 1. Part of the diffused light at the edge of the work mark WAM enters a CCD camera 12 through a pellicle P and lenses L1 and L2. The light below 580 nm is cut by the wavelength selection filter 15 and therefore even the patterns of the work which is coated with the resist and is formed with the protective layer can be detected with high sensitivity without being affected by noise.