发明名称 |
PHOTOSENSITIVE COMPOSITION FOR MAKING PHOTORESIST |
摘要 |
The invention concerns a novel photosensitive composition for photoresist and a system comprising a substrate and a photoresist obtained from said novel composition. The photosensitive composition for photoresist comprises a copolymer with hydrophobic blocks whereof at least one block is an hydrophobic block capable of generating a hydrophilic block and comprising at its end a group selected among dithioesters, thioesters-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating under the effect of a radiation an active species reacting with the hydrophobic block to generate the hydrophilic block. |
申请公布号 |
EP1311907(A1) |
申请公布日期 |
2003.05.21 |
申请号 |
EP20010940668 |
申请日期 |
2001.06.01 |
申请人 |
RHODIA CHIMIE |
发明人 |
PRAT, EVELYNE;DESTARAC, MATHIAS |
分类号 |
C08F293/00;G03F7/039;H01L21/027 |
主分类号 |
C08F293/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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