发明名称 |
METHOD FOR FORMING POLYIMIDE PATTERN USING PHOTOSENSITIVE POLYIMIDE AND COMPOSITION FOR USE THEREIN |
摘要 |
This invention relates to a photosensitive polyimide material having positive-type or negative-type photosensitivity, which may be developed with a high resolution with an irradiation energy having short wavelength such as ultraviolet light or electron beam. The positive-type photosensitive polyimide composition comprising a solvent-soluble polyimide which shows positive-type photosensitivity in the presence of a photoacid generator, which is obtained by polycondensation of at least one aliphatic tetracarboxylic dianhydride and/or alicyclic tetracarboxylic dianhydride and at least one aliphatic diamine and/or alicyclic diamine and/or diaminosiloxane; and the photoacid generator. Since the polyimide has negative-type photosensitivity when irradiated with electron beam in the absence of a photoacid generator, a method for forming negative-type polyimide pattern using the polyimide is also provided. |
申请公布号 |
EP1199604(A4) |
申请公布日期 |
2003.05.21 |
申请号 |
EP20000935501 |
申请日期 |
2000.05.31 |
申请人 |
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发明人 |
ITATANI, HIROSHI;MATSUMOTO, SHUNICHI;ITATANI, TAROU;SAKAMOTO, TSUNENORI;GORWADKAR, SUCHETA;KOMURO, MASANORI |
分类号 |
C08L79/08;G03F7/004;G03F7/023;G03F7/038;G03F7/039;G03F7/075 |
主分类号 |
C08L79/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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