发明名称 REACTION FURNACE FOR MANUFACTURING HIGH-PURITY SILICON AND METHOD OF MANUFACTURING HIGH-PURITY SILICON
摘要 PROBLEM TO BE SOLVED: To provide a reduction reaction furnace for manufacturing high-purity silicon which is passed with cooling water between an inner wall and an outer wall and permits observation of the inside through inner and outer glass windows disposed at the inner wall and outer wall and which prevents the leakage of the water from the glass window on the inner side into the furnace. SOLUTION: The glass 23c on the inner side is held between an inner glass retainer 23a and an outer glass retainer 23b by using an inner window unit 23 separable from the inner wall 11 of a furnace plate 10. In the state that the glass 23c on the inner side is held between both the glass retainers, the inner window unit 23 is subjected to a leak check to decompress or pressurize the inner side of the glass retainer 23a on the inner side. Upon confirmation that there is no leakage to be of a problem, the glass retainer 23a on the inner side of the inner window unit 23 is mounted on the inner wall 11 and a reduction reaction is performed.
申请公布号 JP2003146641(A) 申请公布日期 2003.05.21
申请号 JP20010354956 申请日期 2001.11.20
申请人 SUMITOMO TITANIUM CORP 发明人 YAMAMOTO KENJI
分类号 C01B33/035;(IPC1-7):C01B33/035 主分类号 C01B33/035
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