发明名称 MASK FOR EXPOSURE AND PROTECTIVE LIQUID FOR THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a mask for exposure with a strong image and a protective liquid for the mask for exposure. SOLUTION: The mask for exposure having at least one photosensitive silver halide emulsion layer on a glass substrate and produced by forming blackened silver in the silver halide emulsion layer by development after exposure has a protective layer disposed by coating after image formation as an upper layer on the same side as the image forming layer with respect to the glass substrate and the protective layer comprises an organic-inorganic hybrid material.</p>
申请公布号 JP2003149795(A) 申请公布日期 2003.05.21
申请号 JP20010344966 申请日期 2001.11.09
申请人 MITSUBISHI PAPER MILLS LTD 发明人 NAKAGAWA KUNIHIRO;KAWAI NOBUYUKI;NEKO TOSHIHIKO
分类号 G03C5/00;G03C1/76;G03F1/48;G03F1/56;(IPC1-7):G03F1/14;G03F1/08 主分类号 G03C5/00
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