| 摘要 |
<p>PROBLEM TO BE SOLVED: To minimize a calculation quantity while verifying the pattern precision of the whole semiconductor chip with high precision according to a physical model. SOLUTION: A device which verifies the pattern precision of drawing data obtained by processing design data on a pattern used for lithography is equipped with an input means 20 to which the design data and drawing data are inputted, an evaluation point generating means 21 which generates a plurality of evaluation points for an edge of the design data, an intensity calculating means 22 for calculating a specific value including the intensity of accumulated energy generated through exposure to the drawing data at each evaluation point, a decision means 24 for deciding whether the specific value including the intensity of the accumulated energy at each evaluation point is within a permissible range, and an alarm data output means 26 which outputs alarm data when the specific value including the intensity of the accumulated energy is not within the permissible range.</p> |
