| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material, such as a chemically amplified positive resist material, having various characteristics such as heat resistance, sensitivity and resolution in an excellent balance. SOLUTION: This syndiotactic substituted hydroxystyrene-based polymer which is represented by general formula (1) [R<1> is an acid-unstable group; (a):(b) is 0.1 to 0.9:0.9 to 0.1], whose hydroxy groups are partially protected with the acid-unstable groups, and in which the tacticities of the C1 carbons of the phenyl groups are >=30% pentads, respectively, by<13> C-NMR measurement. And the photosensitive composition comprises the syndiotactic substituted hydroxystyrene- based polymer represented by general formula (1) and an acid-generating agent. |
