| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive composition having high sensitivity, improved suitability to halftone exposure and improved edge roughness of a pattern. SOLUTION: The positive photosensitive composition comprises (A) a specified acid generator which generates an acid upon irradiation with an active ray or radiation, (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, (C) a basic compound of formula (I) and (D) an organic solvent. |
