发明名称 MONOLAYER PATTERN FORMING METHOD, ELECTRICALLY CONDUCTIVE FILM PATTERN FORMING METHOD USING PATTERNED MONOLAYER AND ELECTRO-OPTIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a liquid-repellent monolayer pattern forming method using no glass mask and excellent in pattern forming accuracy and reproducibility of position and to provide a pattern of a semiconductor, a metal or the like formed using the monolayer pattern, an electro-optic device manufactured using the formed pattern and an electronic machine with the electro-optic device. SOLUTION: A monolayer is formed on a substrate by bonding a silane compound having a hydrolyzable group and a carbon-containing group with liquid-repellent ends to the substrate, the top of the substrate is patternwise coated with an alkaline liquid by an ink jet process and the monolayer in the coated areas is removed by the hydrolytic action of the alkaline liquid to form a liquid-repellent monolayer pattern and a patterned lyophilic substrate surface. An electro-optic device is provided using the patterned substrate.
申请公布号 JP2003149831(A) 申请公布日期 2003.05.21
申请号 JP20010344925 申请日期 2001.11.09
申请人 SEIKO EPSON CORP 发明人 FURUSAWA MASAHIRO
分类号 B41J2/01;G03F7/36;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;(IPC1-7):G03F7/36;H01L21/320 主分类号 B41J2/01
代理机构 代理人
主权项
地址