| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition for the intermediate layer of a trilaminar resist capable of forming a crack-free cured film less liable to a change with time and excellent in storage stability as the intermediate layer which does not dissolve during coating process with an upper layer resist and forms no mixing layer at the interface between the intermediate layer and the upper layer resist when a ketone type solvent or an aromatic solvent is used as a solvent for the upper layer resist. SOLUTION: The resin composition comprises (A) a polyorganosilsesquioxane resin having two or more oxetane groups in one molecule and having a weight average molecular weight of 1,000-50,000 and (B) a compound which generates an acid under an electron beam or heat. |
