发明名称 |
Photocleaning |
摘要 |
<p>Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with a purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space. This technique has the advantage that the use of unstable materials such as ozone is avoided. <IMAGE></p> |
申请公布号 |
EP1312983(A2) |
申请公布日期 |
2003.05.21 |
申请号 |
EP20020257913 |
申请日期 |
2002.11.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN SCHAIK, WILLEM;DUISTERWINKEL, ANTONIE ELLERT;MERTENS, BASTIAAN MATTHIAS;MEILING, HANS;KOSTER, NORBERTUS BENEDICTUS |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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