发明名称 PARTICULATE STRUCTURE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide particulate structures having respectively different periodical structures and formed on the same substrate and a method for manufacturing these particulate structures. SOLUTION: First and second particulate structures are formed on the same substrate, the 1st particulate structure has uniform particulate size and periodical structure of particulate arrangement positions and the 2nd particulate structure has uniform particulate size and periodical structure different from that of the 1st particulate structure. The 1st and 2nd particulate structures are respectively patterned as optional shapes. The particulate structure manufacturing method includes a process for applying and developing a dispersion solution of particulate having the uniform particulate size to the surface of the substrate having a recessed pattern on its surface and drying the developed solution to form a particulate film and a process for peeling the particulate film by using an adsorbing tool having a function capable of adsorbing fine particles and laminating respective particulate films to form the particulate structure.
申请公布号 JP2003149401(A) 申请公布日期 2003.05.21
申请号 JP20010400534 申请日期 2001.12.28
申请人 RICOH CO LTD 发明人 HINO TAKESHI
分类号 G02B6/12;B01J19/00;G02B1/02;G02B5/18;(IPC1-7):G02B1/02 主分类号 G02B6/12
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