发明名称 |
Method of manufacturing a semiconductor device and semiconductor device manufactured by the method |
摘要 |
First, a hole pattern or a separation pattern of a first resist that is capable of supplying acid is formed on a semiconductor substrate. Then, a crosslinked film (organic frame) is formed on the side wall of the first resist pattern to obtain a resist pattern having a reduced hole diameter or separation width. Then, the hole diameter or the separation width is further reduced by causing thermal reflow of the crosslinked film. Finally, the semiconductor substrate is etched by using a resulting resist pattern as a mask. |
申请公布号 |
US6566040(B1) |
申请公布日期 |
2003.05.20 |
申请号 |
US19990233217 |
申请日期 |
1999.01.20 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA;RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORPORATION |
发明人 |
SUGINO KANJI;ISHIBASHI TAKEO;SHOYA TAKAYUKI |
分类号 |
H01L21/302;G03F7/00;G03F7/40;H01L21/3065;H01L21/311;H01L21/768;(IPC1-7):G03C5/56;G03C5/18 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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