Semiconductor device fabricating method

摘要

A method of fabricating a semiconductor device in which a LOCOS profile characteristic is applied to a normal shallow trench isolation (STI) structure thereby lowering compressive stress that is concentrated on the side of the STI and preventing a thinning phenomenon by which the oxide film is formed in a relatively thin thickness at the boundary of the STI and the gate oxide film for high voltage (HV) region. The STI of a CVD oxide material including an angular bird's beak extension structure is formed in a field region, a gate oxide film is formed in a relatively thick thickness in a HV region by using a nitride film as a mask, and a gate oxide film having a relatively thin thickness is formed in a low voltage (LV) region.